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1

Vacuum Ultraviolet (VUV)-Light-Induced Outgassing from Resist Polymers: A Study Using In Situ Quartz Crystal Microbalance (QCM) Technique

Shirai, Masamitsu, Shinozuka, Toyofumi, Tsunooka, Masahiro, Itani, Toshiro

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 222 KB

english, 2003

2

Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.

Kishimura, Shinji, Sasago, Masaru, Shirai, Masamitsu, Kataoka, Atsuko, Shinozuka, Toyofumi, Tsunooka, Masahiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 265 KB

english, 2000

3

Polymers as sulfonic acid generator on irradiation at 146 nm

Toyofumi Shinozuka, Masamitsu Shirai, Masahiro Tsunooka

Journal:

European Polymer Journal

Year:

2001

Language:

english

File:

PDF, 302 KB

english, 2001

4

Sulfonic Acid Generating Polymers for 146 nm Irradiation.

Shirai, Masamitsu, Shinozuka, Toyofumi, Tsunooka, Masahiro

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 227 KB

english, 1999

5

Methacrylonitrile Based Si-Containing Polymers for 157-nm Positive Resist.

Shinozuka, Toyofumi, Kawakami, Tomoaki, Okamura, Haruyuki, Tsunooka, Masahiro, Shirai, Masamitsu

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 1.06 MB

english, 2002

6

Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-situ FT-IR Spectroscopy.

Shinozuka, Toyofumi, Tsunooka, Masahiro, Itani, Toshiro, Shirai, Masamitsu

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 557 KB

english, 2002

7

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Evaluation of 157-nm resist structure: outgassing relationship using in situ QCM technique

Shirai, Masamitsu, Sturtevant, John L., Shinozuka, Toyofumi, Takashiba, Shinichi, Horiguchi, Yusuke, Irie, Shigeo, Itani, Toshiro

Year:

2004

Language:

english

File:

PDF, 171 KB

english, 2004

8

Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrene Derivatives by 146nm Light.

Shinozuka, Toyofumi, Shirai, Masamitsu, Tsunooka, Masahiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 388 KB

english, 2000

9

Poly(.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (1) Synthesis, Properties and Photochemistry.

Shirai, Masamitsu, Kataoka, Atsuko, Shinozuka, Toyofumi, Tsunooka, Masahiro, Kishimura, Shinji, Sasago, Masaru

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 409 KB

english, 2000

10

157nm Single-Layer and Bilayer Resists Based on .ALPHA.-Methylstyrene Polymers.

Shirai, Masamitsu, Shinozuka, Toyofumi, Okamura, Haruyuki, Tsunooka, Masahiro, Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru

Journal:

Journal of Photopolymer Science and Technology

Year:

2001

Language:

english

File:

PDF, 1.70 MB

english, 2001

11

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - F2 resist outgassing studied by in situ QCM technique

Shirai, Masamitsu, Shinozuka, Toyofumi, Tsunooka, Masahiro, Ishikawa, Seiichi, Itani, Toshiro, Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 234 KB

english, 2003

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